| 摘要 |
PROBLEM TO BE SOLVED: To improve contrast by obtaining the position information of a mark on an object surface using a signal based on the mark that is obtained by an optical system for overlapping with luminous flux based on the mark and an image pick-up means. SOLUTION: An etching pattern mark 2 is formed on a silicon etching wafer 1, a resist pattern mark 3 is formed on the etching pattern mark 2, then light for preventing a photoresist that is applied onto a wafer 1 with a wavelength of, for example 633 nm, that is oscillation light from an He-Ne laser 31 is applied to each element, and then light is applied to two alignment marks 2 and 3 in a solid shape on the wafer 1. Then, luminous flux from the alignment marks 2 and 3 is guided to a CCD camera 14 via each element, the position information of the alignment marks 2 and 3 is observed by the CCD camera 14, and the position is detected. |
