| 摘要 |
PURPOSE: A method for manufacturing optical thin film type path adjusting apparatus with 2-layer structure is provided to prevent an electric short by a residue by removing the residue generated in a process for etching a mirror surface. CONSTITUTION: A second sacrificial layer is formed to a front surface of an actuator(65) patterned by a pixel. A position of the second sacrificial layer in which a post is formed for supporting a mirror surface. The second sacrificial layer is made of a material such as a photoresist, a poly silicon, an SOP, and an SOG. An aluminum is deposited on a upper portion of the second sacrificial layer, and then the post and the mirror surface are formed. The mirror surface is etched and divided by each actuator(65). A residue with an aluminum material generated when etching the aluminum is removed through a sulfuric acid hydrogen peroxide washing process.
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