发明名称 |
Aqueous developing solutions for reduced developer residue |
摘要 |
An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent, an ethoxylated surfactant having the general formula:R-[O-(CH2-Ch2-O)n]m-X(I)where R is a hydrophobic group, X is H or an anionic group, m is from 1 to 3, and n is at least about 15, preferably at least about 20, more preferably at least about 30.
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申请公布号 |
US6063550(A) |
申请公布日期 |
2000.05.16 |
申请号 |
US19980069517 |
申请日期 |
1998.04.29 |
申请人 |
MORTON INTERNATIONAL, INC. |
发明人 |
LUNDY, DANIEL E.;BARR, ROBERT |
分类号 |
G03F7/32;(IPC1-7):G03F7/32 |
主分类号 |
G03F7/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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