DEVICE FOR CLEANSING WAFER HOLDER PREVENTING SCRATCHING ON CMP PROCESS

摘要

PURPOSE: A device for cleansing a wafer holder is provided to remove slurries from the wafer holder and to drain the removed slurries. CONSTITUTION: A device removes slurries attached to the surface of a wafer holder(108) using a wafer(102) and a deionized(D.I) water supplier(106). The wafer forms a drain hole on the center and contains a drain tube(103) connected to the drain hole and a valve(104) opening and closing the drain tube. Therefore, the device drains the cleansed slurries through the D.I water supplier and the drain tube and prevents the slurries from reattaching in order to prevent the wafer from scratching and generating a particle, caused by the reattaching slurries.