| 摘要 |
PROBLEM TO BE SOLVED: To permit accurate patterning by providing plural holes filled with a material whose property is changed by accepting energy and giving energy to the holes in desired and limited positions to form a pattern. SOLUTION: A resist is irradiated with light in a line-and-space pattern, and the dosage of the light is controlled to obtain, after development, a two-dimensional distribution of openings with accurate positions. The remaining resist is used as a mask to etch the substrate and then removed so that an accurate two-dimensional distribution of holes can be obtd. on the substrate. Then a resist is applied on the substrate to fill the holes, and electron beam drawing is conducted. In this process, desired holes out of two-dimensionally distributed holes are irradiated with the electron beams. After developing the resist, the resist in the unirradiated holes are left. Then the obtd. substrate is subjected to Ni plating, and then the substrate is released to obtain a digital pattern. The resultant substrate is used as a die for patterning to easily duplicate the pattern.
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