发明名称 SEMICONDUCTOR PRESSURE SENSOR AND ITS MANUFACTURE
摘要 PROBLEM TO BE SOLVED: To prevent pressure in a reference pressure chamber from becoming ununiform due to gas generated from a junction interface in heat-treating process for bonding semiconductor substrates, in a semiconductor pressure sensor in which the reference pressure chamber is formed by sticking both of the substrates with each other. SOLUTION: In this semiconductor pressure sensor 100, a cavity 3 is formed on one surface of a first semiconductor substrate 1, a second semiconductor substrate 2 is stuck on the one surface so as to cover the cavity 3, and the substrates 1, 2 are bonded to each other by heat treatment. A reference pressure chamber is formed by the cavity 3 and the second semiconductor substrate 2. Around the cavity 3 in the junction interface of both the substrates 1, 2, a trap chamber 5 for trapping the gas generated from the junction interface in the case of the heat treatment is arranged surrounding the cavity 3.
申请公布号 JP2000133817(A) 申请公布日期 2000.05.12
申请号 JP19980307519 申请日期 1998.10.28
申请人 DENSO CORP 发明人 SENDA ATSUSHIGE;KAWASAKI EIJI;TERADA MASAKAZU;ISHIO SEIICHIRO
分类号 G01L9/04;G01L9/00;H01L21/02;H01L29/84;(IPC1-7):H01L29/84 主分类号 G01L9/04
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