| 摘要 |
PROBLEM TO BE SOLVED: To form highly accurate and fine device patterns. SOLUTION: A double refracting crystal board DR as a member having optical anisotropy is provided at the light exit side of a projecting optical system PL for projecting the image of the pattern of a mask on a wafer W. The image of the mask pattern is distributed into two by the double refracting crystal board DR, and the multiplexed pattern image is formed on the wafer W. The overlapped part of the multiplexed pattern image is obtained as a device pattern, so that proper exposure corresponding to the sensitive characteristics of a photoresist applied on the wafer W can be obtained.
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