发明名称 |
FOCUS RING ARRANGEMENT FOR SUBSTANTIALLY ELIMINATING UNCONFINED PLASMA IN A PLASMA PROCESSING CHAMBER |
摘要 |
A focus ring assembly configured to substantially encircle a chuck of a plasma processing chamber. The focus ring assembly includes an annular dielectric body; and an electrically conductive shield surrounding the annular dielectric body. The electrically conductive shield is configured to be electrically grounded within the plasma processing chamber and includes a tube-shaped portion being disposed outside of the annular dielectric body and surrounding at least part of the annular dielectric body. The electrically conductive shield further includes an inwardly-protruding flange portion being in electrical contact with the tube-shaped portion. The flange portion forms a plane that intersects the tube-shaped portion. The flange portion is embedded within the annular dielectric body.
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申请公布号 |
WO0000992(A3) |
申请公布日期 |
2000.05.11 |
申请号 |
WO1999US14077 |
申请日期 |
1999.06.22 |
申请人 |
LAM RESEARCH CORPORATION;LENZ, ERIC, H. |
发明人 |
LENZ, ERIC, H. |
分类号 |
H05H1/46;C23C16/52;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H01J37/32 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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