Apparatus for sensing RF current delivered to a plasma with two inductive loops

摘要

An apparatus for sensing RF current delivered to a plasma includes an RF conductor along which the current is delivered to the plasma and which is divided into two parts along part of its length so that substantially equal currents flow in each part. A sensor device is inserted into the gap between the two parts of the conductor and includes first and second inductive loops disposed one n each side of the gap such that when an RF current flows along the RF conductor t magnetic flux surrounding the conductor which is generated by the RF current couples with the loops respectively in opposite directions relative to the sensor device. If a stray magnetic flux normal to the current direction couples with the loops in the same direction relative to the sensor device it will induce voltages in the loops which respectively add to the voltage induced by the RF current in one loop and subtract from the voltage induced by the RF current in the other loop. Thus by adding the voltages induced in the loops, for example by connecting them in series, the voltages induced by the stray magnetic flux tend to cancel.