| 摘要 |
PROBLEM TO BE SOLVED: To prevent the occurrence transfer in the part of a substrate which corresponds to a product and to further restrain the effect of particles. SOLUTION: An application/developing device is equipped with a resist application unit (CT), that forms a resist film on a substrate G by applying a resist liquid, a heat processing unit (HP) that pre-bakes the substrate where a resist film is formed, and a developing unit (DEV) that develops the resist film, after it is exposed to light. The heating unit (HP) is equipped with a heating plate 72 and plural support pins 74 that support the substrate G above the heating plate 72, where the support pins 74 are so provided as to support parts other than those that correspond to a product. |
