| 摘要 |
PROBLEM TO BE SOLVED: To provide an impurity removing method for a filter to reduce an amount of a material, such as a boron compound, unfavorable to manufacture of a semiconductor and generated from the filter, to a value lower than a demand value through exposing operation in a short time. SOLUTION: Temporary sheets 21a, 21b... are arranged in a clean room, and a one-way air passage running from an outside air inlet part to an outlet part. A plurality of filters 13a... are arranged in a downward air passage 26a and upward air passages 26b..., and by flowing air along the air passages, impurities discharged from the filters 13a... are improved. Further, air having relative humidity of 50% or more and from which dust is removed is used in air used in removal of the impurities of the filter. This constitution eliminates a need for special exhaust equipment and adsorption equipment for a material unfavorable to manufacture of a semiconductor of impurities, such as a boron compound, and reliably reduces an amount of impurities, such as a boron compound, through a simple method.
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