| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus, capable of accurately comprehending the change of exhausted quantity from a treating part, even if the mist of a treating liq. deposits in exhaust pipelines. SOLUTION: An exhaust port 18 of a cup 6 which covers a substrate holder 2 is connected to an exhaust fan 11 via a main exhaust pipeline 8a having a first damper 16, manual damper 9 and main exhaust pipeline 8b. The main exhaust pipeline 8a has a bypass exhaust pipeline 12 which branches from the upstream of the first damper 16 and joins at the downstream of the first damper 16. The bypass exhaust pipeline 12 has a second damper 13 and a Pitot tube 14. At measurement, the first damper 16 is closed and the second damper 13 is opened. The Pitot tube 14 and manometer 15 measure the total pressure and the static pressure in the bypass exhaust pipeline 12, to obtain the dynamic pressure from the total pressure and static pressure, and obtain the exhaust quantity from the dynamic pressure. The first damper 16 is normally opened, and the second damper 13 is normally closed. |
