UPPER ELECTRODE PART OF PLASMA EQUIPMENT USED IN SEMICONDUCTOR FABRICATION PROCESS

摘要

PURPOSE: An upper electrode part of a plasma equipment used in a semiconductor fabrication process is to improve the plasma confinement capability in a plasma etcher and to thereby restrain the generation of particles. CONSTITUTION: An upper electrode part comprises: a clamp ring(100) having a circular platestructure and acting as a upper electrode; a plasma confinement ring(102) having a fence shaped structure and coupled to a rear surface of the clamp ring along the circular edge of the clamp ring; a silicon cathode(104) having a circular plate structure coupled inside the plasma confinement ring at the rear surface of the clamp ring; and a silicon cathode edge ring(106) coupled along the circular edge of the silicon cathode, sealingly coupled to the inner wall of the plasma confinement ring, and having a height lower than that of the plasma confinement ring. The plasma confinement ring is fixed to the clamp ring by a teflon screw.