| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a hard carbon film capable of forming a hard carbon film on the inside of an opening with tight adhesion and having a uniform film thickness. SOLUTION: This method for forming a hard carbon film is the one that a hard carbon film is formed on the inside of the opening of a sample having the opening, and, the sample 11 is arranged in a vacuum tank 13 provided with a gas introducing port 15 and an exhaust port 17, an auxiliary electrode 23 is arranged at the opening central part in the opening of the sample 11, the auxiliary electrode 23 is connected to the grounded potential, the inside of the vacuum tank 13 is exhaused from the exhaust port 17, thereafter, gas contg. carbon is introduced from the gas introducing port 15 into the vacuum tank 13, the sample is applied with high frequency voltage, and plasma is generated in the vacuum tank 13 contg. the opening to form a hard carbon film on the inside of the opening of the sample 11. |
