| 摘要 |
PURPOSE: An acceptor and a substrate processing system are provided to increase the processing efficiency by a reticle which is not often exchanged in an apparatus such as an exposure apparatus. CONSTITUTION: If a glass substrate is sent from a processor group(11-16) to an acceptor(18), the glass substrate is accepted in a first acceptor corresponding to a layer. When a fixed number of glass substrates are accepted in each acceptor, each glass substrate is sent out to an exposure apparatus(20) continuously by layers and the exposure process is performed, and then each glass substrate is accepted in each original acceptor and the glass substrates are returned to the processor group in the sequence which the glass substrate was sent from the processor group to the acceptor.
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