发明名称 LASER SYSTEM WITH PROJECTED REFERENCE PATTERN
摘要 <p>An apparatus for projecting a pattern into the field of view of an optical system, such as a microscope, comprising a laser for generating a laser beam, projection optics for generating an optical beam carrying the reference pattern, injection optics for combining the optical beam with the laser beam so that both beams propagate in the same direction; and reflection optics for receiving the optical beam and the laser beam and for reflecting the optical beam towards the optical system in order to cause the reference pattern to be visible in the field of view of the optical system. Such an apparatus may be used in conjunction with devices which track and compensate for movement of an object. One application of the instant apparatus pertains to the projection of a pattern for use as an optical alignment reference during eye surgery. In particular, the instant apparatus provides compensation for involuntary eye movements which may misalign the eye with respect to the reference pattern and with respect to the treatment laser beam. A method for projecting a pattern into the field of view of an optical system is also disclosed.</p>
申请公布号 WO2000021475(A1) 申请公布日期 2000.04.20
申请号 US1999023851 申请日期 1999.10.14
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