| 摘要 |
PROBLEM TO BE SOLVED: To conduct a film formation treatment under an optimum condition even in the case of degasing from a substrate. SOLUTION: A vacuum chamber 100 inside is evacuated by a vacuum evacuation device 129 and is maintained in vacuum. A substrate B made of an organic film is transferred from a pay out roll 161 through rollers 162, 163, 164 and is wound to a take up roll 165. Argon and oxygen are introduced into the chamber 100. Oxygen is supplied as degas from the substrate B as well. A mass spectrometer 140 detects an argon quantity and an oxygen quantity in the chamber 100. A film formation controller 150 performs feed back control of the oxygen introducing quantity by a flow regulatory 135 to as to maintain a ratio of argon: oxygen fixed.
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