发明名称 STRUCTURE FOR FORMING HIGH DEGREE OF CLEANNESS REGION IN CLEAN ROOM
摘要 PROBLEM TO BE SOLVED: To provide a structure for forming a high degree of cleanness region of a clean room to prevent the occurrence of oscillation even when an external force is exerted and a laminar flow is generated at the periphery of a manufacturing device. SOLUTION: A manufacturing device 26 is moved to a position below a clean air outlet 16 formed on a ceiling surface 12 and a clean region containing the clean air outlet 16 is set. After a partition plate 30 is suspended from the ceiling surface 12 toward a floor 22 along this cleaning region, the partition plate 30 is extended according to the height of the manufacturing device 26, and the manufacturing device 26 is surrounded with the partition plate 30. When a fixing means mounted on the upper side of the manufacturing device 26 and a protrusion plate are arranged, currents into which a current is divided by the protrusion plate are not confluent to each other but a laminar flow of clean air is formed at the front of the manufacturing device 26.
申请公布号 JP2000111112(A) 申请公布日期 2000.04.18
申请号 JP19980294662 申请日期 1998.10.01
申请人 HITACHI PLANT ENG & CONSTR CO LTD 发明人 TAKITANI HISATOSHI;SAITO KENJI
分类号 F24F7/06;(IPC1-7):F24F7/06 主分类号 F24F7/06
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