PLASMA ETCHING CHAMBER FOR MANUFACTURING SEMICONDUCTOR DEVICES

摘要

PURPOSE: A plasma etching chamber is provided to easily identify a leak of cooling water for controlling temperature of the etching chamber by using a transparent cover mounted on the outer wall of the process chamber. CONSTITUTION: A plasma etching chamber(10) includes a cover(12) made of transparent materials formed at outside of the etching chamber(10). The transparent cover(12) further comprises a plurality of water emitting holes(14) for emitting waters in accordance with a leak of a cooling water. By identifying inner state of the etching chamber(10) with naked eye using the transparent cover(12), the processing failure is previously prevented.