SCRUBBER FOR MANUFACTURING SEMICONDUCTOR

摘要

PURPOSE: A method for a scrubber to manufacturing semiconductor is provided to dispose of waste gas regardless of an oxidized chamber's working. CONSTITUTION: An oxidized chamber(1) is connected to a scrubber and an oxidized catalytic room are linked to the scrubber in a raw so that the oxidized chamber may put the waste gas heading toward the oxidized chamber to the oxidized catalytic room(6) via the first branched line separated from an incoming line for waste gas(11) in the case dregs accumulate inside a heater or the heater cannot work on. Whereby, the toxicity within the waste gas is converted to harmless oxides in the shape of fume, and the oxides and the waste gas are emitted into air through cooling process, separating process, and pressurizing process. The third incoming line(8) for air and an air-blower are linked with the oxidized catalytic room so that additional air may is supplied to the oxidized catalytic room(6).