CHEMICAL VAPOR DEPOSITION DEVICE FOR FABRICATING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A chemical vapor deposition device for fabricating a semiconductor device is provided to prevent degradation of a liquid flow controller by removing a chemical stagnated in a line of the liquid flow controller. CONSTITUTION: A chemical vapor deposition device for fabricating a semiconductor device comprises a liquid flow controller. The liquid crystal controller controls flow-in amount of a chemical. An air valve and a doped/undoped valves are installed at a rear end of the liquid flow controller. The device further comprises a divert valve for removing the chemical and a pump for performing a pumping process. A valve is installed at a front end of the device to remove the chemical stagnated in the liquid flow controller and a line of the front end.