发明名称 SAMPLE GAS DISTRIBUTING METHOD COUPLED BY PROCESS GAS EVALUATION APPARATUS
摘要 PURPOSE: A sample gas dividing apparatus coupling with a gas evaluation apparatus for a semiconductor process and a driving method thereof is provided to increase the capability of evaluation by supplying one of the apparatus being different from each other in characteristics for supplying with the sample gas by using a dividing apparatus. CONSTITUTION: A sample gas is flown from a source. The sample gas is charged by a predetermined pressure, and discharged through the first path. The second path is connected to the discharging part of the first path so as to discharge the sample gas to an evaluation apparatus for the specific analysis. The third path is connected to the charging part of the first path so as to supply the cleaning gas for cleaning the remaining gas and a foreign substance of the first path and the second path.
申请公布号 KR100251645(B1) 申请公布日期 2000.04.15
申请号 KR19970009876 申请日期 1997.03.21
申请人 SAMSUNG ELECTRONICS CO, LTD. 发明人 LEE, SUK HO
分类号 H01L21/66;G01N30/02;G01N30/06;G01N33/00;(IPC1-7):H01L21/66 主分类号 H01L21/66
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