发明名称 Layout for semiconductor store with dual-port memory cells
摘要 Semiconductor memory or store layout arrangement includes a number of memory cells (SZ1,SZ2) and at least one selection transistor (AT1,AT2) is used with at least one capacitive element (ST) in each of the memory or storage cells (SZ1,SZ2), with the load paths connected in series. The series arrangement of the load paths defines an output of a memory cell (SZ1,SZ2) which is connected via two contact terminals (K1,K2) to two output lines (BL1,BL2), The output paths (A1,A2) of each adjacent memory or storage cell are connected to a common output line (BL1,BL2). The output path (A1;A2) of a memory cell (SZ1,SZ2) is made specifically L-shaped, in the lateral projection. The capacitive element (KE) is specifically designed as a storage transistor (ST1,ST2) or as a storage capacitor.
申请公布号 DE19845124(A1) 申请公布日期 2000.04.13
申请号 DE19981045124 申请日期 1998.09.30
申请人 SIEMENS AG 发明人 JAIN, RAJ KUMAR
分类号 G11C11/403;G11C11/404;G11C11/405;G11C11/406;G11C11/4091;H01L21/8242;H01L27/108;H01L27/11;(IPC1-7):H01L27/105 主分类号 G11C11/403
代理机构 代理人
主权项
地址