发明名称 MICROWAVE PLASMA PROCESSING SYSTEM
摘要 PROBLEM TO BE SOLVED: To obtain a microwave plasma processing system which can be installed in a limited space by reducing the total size as much as possible even if a reactor has a large diameter. SOLUTION: An antenna 11 having an annular waveguide type antenna part 12 is secured to the upper surface of a cover member 10 and an introducing part 13 is coupled with an opening made in the outer circumferential surface of the antenna part 12. A plurality of slits 15 are made at a part of the cover member 10 facing the antenna part 12 wherein two slits 12 are made at positions separated by distances (2n-1).λg/4, respectively, to the opposite sides along a circle C from the intersection P1 remote from the introducing part 13 out of two intersections of the circle C and the extension of center line of the introducing part 13 and remaining slits 15 are made at positions separated by distances m.λg/4, respectively, to the opposite sides along the circle C.
申请公布号 JP2000106359(A) 申请公布日期 2000.04.11
申请号 JP19990069169 申请日期 1999.03.15
申请人 SUMITOMO METAL IND LTD 发明人 MATSUMOTO NAOKI;NAKANISHI TOSHIO
分类号 H01L21/302;H01L21/3065;H05H1/46 主分类号 H01L21/302
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