| 摘要 |
PROBLEM TO BE SOLVED: To provide a dresser of polishing cloth for a semiconductor substrate which allows manufacture of a semiconductor of long life and high quality and yield for a metal CMP using an acidic slurry, by removing the blinding of the polishing cloth and stabilizing a polishing speed. SOLUTION: A dresser of a polishing cloth, used in a flattening polishing process for a semiconductor substrate where a supporting member of a metal and/or alloy is brazed with diamond particle in a single layer by an alloy, having a melting-point 600-1,200 deg.C, comprising at least one kind from among titanium, zirconium, and chrome containing 0.5-20 wt.% with at least one kind selected from among gold, platinum, and silver containing 30-99.5 wt.%. The surface of alloy, having melting-point dresser 600-1,200 deg.C, of the dresser is provided with a thin film of high acid-resistance. |
