| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive type photosensitive polyamic acid composition which gives a pattern having good resolution, does not require post-exposure heating for development, is easily prepared in a simple system and has good shelf stability by incorporating a specified polyamic acid and an o- quinonediazido compound. SOLUTION: The photosensitive polyamic acid composition contains a polyamic acid of the formula [where (n) is a positive integer] and an o- quinonediazido compound. The polyamic acid is obtained, e.g. by polymerizing 4,4'-oxydiphthalic acid dianhydride and 2,2-bis(4-aminophenyl)hexafluoropropane in a molar ratio of 80:10O to 100:80 in an organic solvent such as N-methyl-2- pyrrolidone or N,N-dimethylformamide. The o-quinonediazido compound preferably contains two or more o-quinonediazido groups in one molecule. |
