发明名称 EXPOSURE METHOD AND EXPOSING DEVICE
摘要 PROBLEM TO BE SOLVED: To manufacture accurately a diffraction grating on a side surface of a rotary shaft of a motor, a side surface of a rotary shaft of a finger joint of a robot, and the like, directly. SOLUTION: A pattern on a mask 1 being an original plate is transcribed to a non-flat plane work 10. The mask 1 is moved in the prescribed direction in a state in which the mask 1 is irradiated with a luminous flux L from an exposure light source. And the pattern on the mask 1 is transcribed on the non-flat plane work 10 by rotating the non-flat plane work 10 by rotation quantity corresponding to movement of this mask 1. Thereby, exposure for performing accurate transcription on a non-flat plane work can be realized. Also, it is preferable that a mask is contacted with a non-flat work and the non-flat work is rotated in accordance with movement of a mask.
申请公布号 JP2000098627(A) 申请公布日期 2000.04.07
申请号 JP19980271997 申请日期 1998.09.25
申请人 OKUMA CORP;HANE KAZUHIRO 发明人 HANE KAZUHIRO;SASAKI MINORU;YASHIRO ATSUSHI;MATSUI KEIJI
分类号 G03F7/24;(IPC1-7):G03F7/24 主分类号 G03F7/24
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