发明名称 FINE PARTICLE REMOVING APPARATUS
摘要 PROBLEM TO BE SOLVED: To obtain a fine particle removing apparatus which can remove fine particles in an abrasive and can provide the desired CMP characteristics. SOLUTION: A filtering line 102 is provided, extended from an abrasive storage tank 101 and to come back thereto. A pump 103 for sending out an abrasive solution, an MF filter for removing large-diameter particles, and an UF filter 105 for removing fine particles in the filtering line 102 to be connected in series. An electrolyte bath 107, for storing permeable water with particles removed by the UF filter 105, is connected to the UF filter 105. The electrolyte bath 107 is provided with a power source 108 and electrodes 109, an electric field is applied to the permeable water 106 to deposit fine particles on the electrodes 109 to separate the water into fine particles and solution. A pipe for returning the solution containing no fine particles back to the tank 101 is provided as a permeable water return line 110.
申请公布号 JP2000100759(A) 申请公布日期 2000.04.07
申请号 JP19980267741 申请日期 1998.09.22
申请人 TOSHIBA CORP 发明人 MINAMI YOSHIHIRO;MIYASHITA NAOTO;TAKAYASU ATSUSHI;IZAKI AKIHISA
分类号 H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/304
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