发明名称 |
Vapor rinse-vapor dry processing tool |
摘要 |
A cleaning apparatus for cleaning chemically processed articles between chemical processing steps. The cleaning apparatus includes a sealable pressurization vessel. After a chemical process step, an article, such as a semiconductor wafer is placed in the vessel. The vessel is sealed. Vessel pressure is adjusted. Solvent in the vessel is heated to a boil forming a vapor. Solvent vapor is recondensed by a primary condensing coil. Condensed solvent rains onto the article, washing it. After the article is clean, it is dried when a secondary condensing coil condenses the solvent vapor, causing the distilled solvent to rain into and be collected by a collection tray. Collected solvent is channelled into a storage reservoir. The storage reservoir is sealed after all of the solvent is collected. The vessel is opened to remove the cleaned article.
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申请公布号 |
US5682913(A) |
申请公布日期 |
1997.11.04 |
申请号 |
US19950446358 |
申请日期 |
1995.05.22 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
LAWSON, MARGARET JANE;LEONARD, EDWARD JOSEPH;NANSEN, JON HOWARD |
分类号 |
B08B3/08;H01L21/00;H01L21/304;(IPC1-7):B08B3/10 |
主分类号 |
B08B3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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