METHOD FOR SETTING REFERENCE VALUE OF PARTICLE MEASURING DEVICE FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method for setting a reference value of a particle measuring device for a semiconductor device easily sets a reference value of many particle measuring devices mounted in a semiconductor device manufacturing line. CONSTITUTION: A method for setting a reference value of a particle measuring device, in a particle size setting step, compares a reference value being a size of a standard particle on a specific wafer having many standard particles of different size with a comparison value that the comparison measuring device measures a size of the standard particle size on the wafer, and sets the reference value in the comparison particle measuring device. Each reference value is measured by the reference particle measuring device, and is the number of real particles and the number of COP(crystal originated particle)s presented in another wafer. Each result value is measured by the comparison particle measuring device, and is the number of real particles and the number of COPs presented in the wafer. According to the comparison result, the reference value is set as the comparison particle measuring device. Thereby, a measuring data reliability is enhanced.