发明名称 METHOD FOR PREPARING A H2-RICH GAS AND A CO2-RICH GAS AT HIGH PRESSURE
摘要 <p>The present invention concerns a method for preparing a CO2-rich gas stream for injection purposes or deposition, and a hydrogen rich gas stream, the method comprising the following steps: a) natural gas and H2O are fed into a one-step reforming process for preparing a gas mixture comprising CO2 and H2 under supercritical condition for water from about 400 °C to about 600 °C, andpressure from about 200 to about 500 bar in the reforming reactor; b) the gas mixture from a) is separated into a H2-rich and a CO2-rich gas stream, respectively. The invention also comprises use of CO2-rich gas stream for injection into marine formations, and use of H2-rich gas stream for hydrogenation, as a source of energy/fuel in fuel cells and for production of electricity.</p>
申请公布号 WO2000018681(A1) 申请公布日期 2000.04.06
申请号 NO1999000283 申请日期 1999.09.15
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