发明名称 |
Back sputtering shield |
摘要 |
An improved target assembly for a deposition chamber wherein the backing plate which mounts a metal target has a groove for receiving a target shield. The target shield can be replaced during normal cleaning operations without replacement of the remainder of the target assembly. The target shield can be used with targets having tapered edges.
|
申请公布号 |
US6045670(A) |
申请公布日期 |
2000.04.04 |
申请号 |
US19970780752 |
申请日期 |
1997.01.08 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ADAMS, BRET;HAMILTON, GREGORY N. |
分类号 |
C23C14/34;H01J37/34;H01L21/203;H01L21/31;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|