发明名称 |
Alignment method and apparatus using previous layer calculation data to solve critical alignment problems |
摘要 |
An method and apparatus for aligning a mask to a wafer for photolithographic processing steps which does not use optical alignment. Each wafer is provided a unique identification code, such as a bar code. As wafers are processed through photolithographic steps where optical detection of an alignment mark can be easily accomplished the alignment data for each wafer is stored in a memory unit. At the next photolithographic step a detector reads the identification code and identifies the wafer being processed. The wafer identification is fed to a data processing unit which retrieves the alignment data for that wafer fro the memory unit. The data processing unit then feed alignment data to a mechanical controller which positions the wafer relative to the mask image being used in the photolithographic step.
|
申请公布号 |
US6043864(A) |
申请公布日期 |
2000.03.28 |
申请号 |
US19990263542 |
申请日期 |
1999.03.08 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY |
发明人 |
LO, YI-CHUAN;LEE, CHIH-HSIUNG |
分类号 |
G03F7/20;G03F9/00;(IPC1-7):G03B27/42;G01B11/00 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|