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发明名称
GAS COMPOSITION FOR DRY ETCHING AND PROCESS OF DRY ETCHING
摘要
申请公布号
EP0948033(A4)
申请公布日期
2000.03.22
申请号
EP19970910616
申请日期
1997.10.30
申请人
JAPAN AS REPRESENTED BY DIRECTOR-GENERAL;THE MECHANICAL SOCIAL SYSTEMS FOUNDATION;ELECTRONIC INDUSTRIES ASSOCIATION OF JAPAN;NIPPON ZEON CO., LTD.
发明人
SEKIYA, AKIRA;YAMADA, TOSHIRO;GOTO, KUNIAKI;TAKAGAKI, TETSUYA
分类号
H01L21/3065;H01L21/311;H01L21/3213;(IPC1-7):H01L21/306
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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