发明名称 MEASUREMENT METHOD USING SECONDARY ELECTRON MULTIPLICATION ELEMENT AND DEVICE USING SECONDARY ELECTRON MULTIPLICATION ELEMENT
摘要 PROBLEM TO BE SOLVED: To maintain accurate measurement without recalibrating a measurement system during use by using the ratio of an initial intensity value where light intensity is measured to light intensity value during use at the initial stage of the installation of a secondary electron multiplication element. SOLUTION: A vacuum measurement part 1 is composed of an ion generation part 3 and an ion detection part 4 that oppose each other via a cylindrical electrode 2. The ion detection part 4 is composed by a secondary electron multiplication element, and a negative high voltage from a DC high-voltage power supply 10 is applied to an entrance part 4b of a trumpet-shaped secondary electron multiplication element. The measurement value of a particle such as a charged particle being measured is multiplied, as a correction coefficient, by a ratio A/B between an initial intensity value A that is obtained by measuring the intensity of light such as soft X rays at the initial stage of the installation of the secondary electron multiplication element and an intensity value B of light being measured during use, thus performing accurate measurement without calibrating a measurement system by stopping measurement. The method can be effectively applied to the measurement of a vacuum pressure and surface analysis, and efficiency is improved by providing an operation device for executing the correction.
申请公布号 JP2000081359(A) 申请公布日期 2000.03.21
申请号 JP19980251311 申请日期 1998.09.04
申请人 ULVAC JAPAN LTD 发明人 AKIMICHI HITOSHI;TAKEUCHI KIYOUKO;TSUJI YASUSHI;ARAKAWA ICHIRO
分类号 G01L21/30;(IPC1-7):G01L21/30 主分类号 G01L21/30
代理机构 代理人
主权项
地址
您可能感兴趣的专利