发明名称 MEDAL POLISHING MACHINE
摘要 PROBLEM TO BE SOLVED: To enable the reduction of the device and the incorporation of the device into a medal transporting path by eliminating the need for a housing vessel and to obtain high reliability and to surely remove stains by sufficient wiping-away force by not using pellets, hot water, etc. SOLUTION: A circumferential circuit 9 is formed by stretching an endless belt 7 on parallel rollers 5a and 5b in a horizontal direction. A first polishing and transporting means 3 and a second polishing and transporting means 19 having the front surface part of the circumferential circuit 9 as a medal transportation face 11 are composed. Medals inverted inside out by dropping from the transporting direction terminal of the first polishing and transporting means 3 are received by the medal transportation face 1 of the second polishing and transporting means 19. A cloth material 37 is arranged to face a portion of the medal transportation face 11 of the first polishing and transporting means 3 and the second polishing and transporting means 19 apart a spacing. The first polishing and transporting means 3 and the second polishing and transporting means 9 are provided with a pressing means for pressing the cloth material 37 atop the medals 15 transferred by the metal transportation face 11.
申请公布号 JP2000079266(A) 申请公布日期 2000.03.21
申请号 JP19980250592 申请日期 1998.09.04
申请人 OIZUMI CORP 发明人 TANAKA TOMOHIRO
分类号 B24B21/00;A63F5/04;A63F7/02;(IPC1-7):A63F7/02 主分类号 B24B21/00
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