发明名称 SRAM cell configuration and method for its fabrication
摘要 The SRAM cell configuration has at least six transistors in each memory cell. Four of the transistors form a flip-flop and they are arranged at the corners of a quadrilateral. The flip-flop is driven by two of the transistors, which are disposed so as to adjoin diagonally opposite corners of the quadrilateral and outside the quadrilateral. Adjacent memory cells along a word line can be arranged in such a way that a first bit line and a second bit line of the adjacent memory cells coincide. The transistors are preferably vertical and are arranged at semiconductor structures (St1, St2, St3, St4, St5, St6) produced from a layer sequence. Two of the transistors having n-doped channel regions are preferably formed in each case on two semiconductor structures.
申请公布号 US6038164(A) 申请公布日期 2000.03.14
申请号 US19980200071 申请日期 1998.11.25
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 SCHULZ, THOMAS;AEUGLE, THOMAS;ROESNER, WOLFGANG;RISCH, LOTHAR
分类号 H01L21/8244;H01L27/11;(IPC1-7):G11C11/00 主分类号 H01L21/8244
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