发明名称 FEEDING SYSTEM AND METHOD OF TREATMENT SOLUTION, TREATMENT APPARATUS, AND INTERMEDIATE STORING MECHANISM
摘要 PROBLEM TO BE SOLVED: To provide a feeding system of treatment solution such as development solution without generating pulsation of discharged treatment solution or a forcibly feeding gas like a nitrogen gas in the discharged treatment solution. SOLUTION: A feeding system of a treatment solution includes intermediate storing mechanisms 51 and 52, or storing treatment solution temporarily from a treatment-solution feeding source and discharging again the treatment solution under a given pressure, fluid feeding mechanisms 75, 76 and 77 for feeding fluid for applying pressure to the treatment solution stored in the intermediate storing mechanisms 51 and 52. The intermediate storing mechanisms 51 and 52 have a container 53 with an inlet opening 59 and a discharging opening 60 for storing the treatment solution flowing inside through the inlet opening 59 and discharging the treatment solution, and a pressure applying body 63 in the container 58. The pressure applying body 63 is provided between the treatment solution and the fluid from the fluid feeding mechanisms 75, 76, and 77 for applying fluid pressure to the treatment solution.
申请公布号 JP2000077324(A) 申请公布日期 2000.03.14
申请号 JP19990148502 申请日期 1999.05.27
申请人 TOKYO ELECTRON LTD 发明人 KIMURA YOSHIO;OKUBO TAKAHIRO
分类号 B05C11/10;G03F7/30;H01L21/027;H01L21/304;(IPC1-7):H01L21/027 主分类号 B05C11/10
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