| 摘要 |
PROBLEM TO BE SOLVED: To prevent generation of tilting or deformation of a support part of a stage or projection optical system caused by the reaction of a driving force generated at the time of accelerating the stage having a wafer or reticle mounted thereon. SOLUTION: The projecting exposure apparatus subjects a wafer 6 to projecting exposure by projecting a pattern image of a reticle 11 onto the wafer 6. In this case, the apparatus includes a projection optical system PL for projecting the pattern image of the reticle 11 onto the wafer 6, a first column 12A for supporting the optical system PL, a reticle stage 9 for moving while holding the reticle 11 thereon, and application means 14A, 15A, etc., for applying a force to the first column 12A according to a reaction generated when the stage 9 is moved.
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