发明名称 Ion implantation dosimetry method and apparatus
摘要 A sample (6) is exposed to a beam of positrons and a detector (8) detects gamma radiation produced by positron annihilation in the sample. A computer-controlled data collection and analysis system (20) analyses the detected gamma radiation to produce a readout of sample implantation dose. The energy of the positrons can be set to a predetermined value to derive a measure of implantation dose at a selected depth within the sample.
申请公布号 AU5184699(A) 申请公布日期 2000.03.14
申请号 AU19990051846 申请日期 1999.08.04
申请人 UNIVERSITY OF SURREY 发明人 ANDREW PETER KNIGHTS;PAUL GRENVILLE COLEMAN;RUSSELL MARK GWILLIAM
分类号 G01N23/22 主分类号 G01N23/22
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