发明名称 |
Ion implantation dosimetry method and apparatus |
摘要 |
A sample (6) is exposed to a beam of positrons and a detector (8) detects gamma radiation produced by positron annihilation in the sample. A computer-controlled data collection and analysis system (20) analyses the detected gamma radiation to produce a readout of sample implantation dose. The energy of the positrons can be set to a predetermined value to derive a measure of implantation dose at a selected depth within the sample. |
申请公布号 |
AU5184699(A) |
申请公布日期 |
2000.03.14 |
申请号 |
AU19990051846 |
申请日期 |
1999.08.04 |
申请人 |
UNIVERSITY OF SURREY |
发明人 |
ANDREW PETER KNIGHTS;PAUL GRENVILLE COLEMAN;RUSSELL MARK GWILLIAM |
分类号 |
G01N23/22 |
主分类号 |
G01N23/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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