发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a dielectric-isolated power IC, without using a bonded SOI wafer. SOLUTION: A semiconductor device has a silicon substrate 101, an insulating substrate 28 bonded to the silicon substrate 101, a plurality of elements 101, 201, 301 formed on the silicon substrate 101 and isolated from each other by a dielectric, a first electrode 26 formed on a plane where the silicon substrate 101 is bonded to the insulating substrate 28 and connected to these elements, and a second electrode 21 formed on the insulating substrate 28 and connected to the first electrode 26.
申请公布号 JP2000077548(A) 申请公布日期 2000.03.14
申请号 JP19980242908 申请日期 1998.08.28
申请人 TOSHIBA CORP 发明人 FUNAKI HIDEYUKI
分类号 H01L21/762;H01L21/02;H01L21/822;H01L21/8249;H01L27/04;H01L27/06;H01L27/088;H01L27/12;H01L29/78;H01L29/786;(IPC1-7):H01L21/824 主分类号 H01L21/762
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