发明名称 PHOTOSENSITIVE MATERIAL PROCESSOR
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive material processor capable of preventing developing irregularity and improving the speed of development processing by avoiding the influence of the condition of developer in the development of film. SOLUTION: This photosensitive material processor is provided with a processing container for performing the development processing by immersing the film F in the developer, and a tubular member 70 equipped with spray holes 71 to 77 spraying the developer to the developing surface Fb of the film immersed; and many spray holes are arranged at some intervals in the longitudinal direction of the film and the number of the adjacent spray holes is different each other.
申请公布号 JP2000075458(A) 申请公布日期 2000.03.14
申请号 JP19980259109 申请日期 1998.08.31
申请人 KONICA CORP 发明人 ISOGAWA WATARU
分类号 G03D3/04;(IPC1-7):G03D3/04 主分类号 G03D3/04
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