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发明名称
PROCEDIMENTO DI FABBRICAZIONE DI DISPOSITIVI INTEGRATI CON RIDUZIONE DEL DANNEGGIAMENTO DA PLASMA.
摘要
申请公布号
ITTO20000232(D0)
申请公布日期
2000.03.10
申请号
IT2000TO00232
申请日期
2000.03.10
申请人
STMICROELECTRONICS S.R.L.
发明人
VASSALLI OMAR;ALBA SIMONE
分类号
主分类号
代理机构
代理人
主权项
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