BIT LINE CONTACT INSPECTION METHOD IN SEMICONDUCTOR DEVICE

摘要

PURPOSE: A bit line contact inspection method in semiconductor device is provided to inspect whether the bit line contact is opened or not by using an in-line scanning electron microscope(SEM). CONSTITUTION: The bit line contact inspection method is comprising the steps of forming an interlayer insulating film on a semiconductor substrate, etching the interlayer insulating film to form a contact hole, forming a conductive film on the interlayer insulating film and the contact hole, etching back the conductive film to expose the interlayer insulating film, irradiating lights onto the conductive film, and detecting a color between the semiconductor substrate and the conductive film and according to the color, deciding whether the bit line contact is opened or not.