| 摘要 |
PROBLEM TO BE SOLVED: To hold a substrate of a large area almost horizontally by making up a correction section installed at a lower position than the horizontal plane where a substrate is held, in such a structure that it may correct the deformation of the substrate caused by the dead weight. SOLUTION: When a mask M is transferred onto a mask table 9, the mask M is chucked and held on the mask table 9 by chucking and holding sections 4, 5, 6 while correction sections 19 support the mask M on both sides of the chucking and holding section 6 to correct the deformation of the mask M caused by the dead weight. The correction sections 19 are disposed nearly opposite to the chucking and holding sections 4, 5 to correct the deformation of the mask M, so that the deformation may be uniform anywhere in the scanning direction to prevent the influence of the deformation caused by the dead weight in the cross-scanning direction on the exposure accuracy. The upper faces of the correction sections 19 of a deformation correction mechanism 18 are located lower by a distanceαthan the chucking face of the chucking and holding section 6, and therefore it could influence the exposure accuracy. If such is the case, elevation sections 20, 20 are driven to raise the upper faces of the correction sections 19 a little bit. |
