发明名称 MANUFACTURE FOR MICROBRIDGE SENSOR
摘要 <p>PROBLEM TO BE SOLVED: To prevent a Ta2O5 film used as an etching mask from peeling and separating. SOLUTION: An insulating thin film 5 used as an etching mask when a metallic thin film 4 formed on a substrate 2 is to be patterned to form a thin film heater 6 and temperature sensors 7, 8 is formed of Ta2O5. A film thickness is made 2000Åor larger. Since the insulating thin film 5 is increased in strength, the insulating thin film 5 is hard to generate a crack even when a stress is generated because of a difference of contraction factors of the metallic thin film 4 and insulating thin film 5 in a cool process after the formation of the insulating thin film 5. A film peeling is thus prevented.</p>
申请公布号 JP2000065617(A) 申请公布日期 2000.03.03
申请号 JP19980233905 申请日期 1998.08.20
申请人 RICOH CO LTD;RICOH ELEMEX CORP 发明人 SHOJI HIROYOSHI
分类号 G01F1/68;C23F1/00;G01F1/692;(IPC1-7):G01F1/68 主分类号 G01F1/68
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