发明名称 |
MANUFACTURE FOR MICROBRIDGE SENSOR |
摘要 |
<p>PROBLEM TO BE SOLVED: To prevent a Ta2O5 film used as an etching mask from peeling and separating. SOLUTION: An insulating thin film 5 used as an etching mask when a metallic thin film 4 formed on a substrate 2 is to be patterned to form a thin film heater 6 and temperature sensors 7, 8 is formed of Ta2O5. A film thickness is made 2000Åor larger. Since the insulating thin film 5 is increased in strength, the insulating thin film 5 is hard to generate a crack even when a stress is generated because of a difference of contraction factors of the metallic thin film 4 and insulating thin film 5 in a cool process after the formation of the insulating thin film 5. A film peeling is thus prevented.</p> |
申请公布号 |
JP2000065617(A) |
申请公布日期 |
2000.03.03 |
申请号 |
JP19980233905 |
申请日期 |
1998.08.20 |
申请人 |
RICOH CO LTD;RICOH ELEMEX CORP |
发明人 |
SHOJI HIROYOSHI |
分类号 |
G01F1/68;C23F1/00;G01F1/692;(IPC1-7):G01F1/68 |
主分类号 |
G01F1/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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