| 摘要 |
<p>An etchant composition for etching an ITO layer deposited on various electronic parts is disclosed. The etchant composition includes oxalic acid and its salts or aluminum chloride as its main components. For etching parameters which vary and as the needs may occur, the composition may appropriately comprise a persulfate or a surfactant. Due to its stable property as a composition and its characteristics of lessening the fuming effect prevalent with the conventional etchants, the etchant composition markedly reduces environmentally hazardous agents. The etchant composition has minimizing effects of side-etching, thus micropatterns can be more efficiently and accurately achieved.</p> |
