Novel monomers for photoresist, polymers thereof and photoresist compositions using the same

摘要

Monomers for preparing photoresist polymers, polymers thereof, and photoresist compositions using the same. The monomers of the invention are represented by the following Chemical Formula 1: wherein, X and Y individually represent oxygen, sulfur, CH2 or CH2CH2; n is an integer of 0 to 5; and R1, R2, R3 and R4 individually represent hydrogen, C1 - C10 alkyl having substituent(s) on its main or branched chain, C1 - C10 ester having substituent(s) on its main or branched chain, C1 -C10 carboxylic acid having substituent(s) on its main or branched chain, C1 - C10 ester having substituent(s) including one or more hydroxyl group(s) on its main or branched chain, C1 - C10 carboxylic acid having substituent(s) including one or more hydroxyl group(s) on its main or branched chain, provided that at least one of R1 to R4 represent(s) -COO-R'-OH wherein R' is a linear or branched chain alkyl group with or without substituent(s) on its linear or branched chain. Polymers according to the present invention preferably comprise (i) a monomer of Chemical Formula 1 above as the first comonomer, (ii) a polyalicyclic derivative having one or more acid labile protective group(s) as the second comonomer, and (iii) at least one polymerization-enhancing monomer, preferably selected from the group consisting of maleic anhydride, maleimide derivatives, and combinations thereof. In order to increase photosensitivity, it is also preferable for the photoresist copolymer to comprise (iv) a polyalicyclic derivative having one or more carboxylic acid groups, as an additional comonomer.