Di- and triphenyl monoterpene hydrocarbon derivatives, dissolution inhibitors, and chemically amplified positive resist compositions

摘要

Di- or triphenyl monoterpene hydrocarbon derivatives of formula (1) are novel. X is a di- or trivalent monoterpene hydrocarbon group, R1 to R3 are hydrogen or an alkyl, alkoxy, alkoxyalkyl, alkenyl or aryl group, R4 is hydrogen or an acid labile group, at least one R4 being an acid labile group, letter n is an integer of 1-5, j, k and m are integers of 0-4, n+j+k+m=5, and p is 2 or 3. When used as a dissolution rate regulator, the compound of formula (1) exerts remarkably enhanced dissolution inhibitory effect and minimized light absorption in the deep-UV region. A chemically amplified positive resist composition having the compound of formula (1) blended therein is highly sensitive to actinic radiation such as deep-UV radiation, electron beam and X-ray, especially KrF excimer laser light, and has improved sensitivity, resolution and plasma etching resistance.