| 摘要 |
PROBLEM TO BE SOLVED: To enable the uniform washing of a substrate by making the flow of washing liquid in a washing tank uniform. SOLUTION: The substrate washing apparatus 1 has the washing tank 2 which is divided to a washing tank upper part 4 and a washing tank lower part 5 by a flow regulating plate 3, a flow passage 7 which is formed to enclose the washing tank lower part 5, a communicating opening 51 for the washing tank lower part 5 and the flow passage 7, a flow regulating plate 8 for the washing tank lower part which covers the communicating opening 51 and a washing liquid supply pipe 6 which is connected and opened to the four corners of the flow passage 7. The substrate 10 housed in a cassette 9 is placed in the washing tank upper part 4. When the washing liquid is supplied under and at a specified pressure and flow rate from the washing liquid supply pipe 6, the washing liquid flows circumferentially in the flow passage 7 and is subjected to a first stage of flow regulation with the flow regulating plate 8 for the washing tank lower part and thereafter, the washing liquid flows from the circumference into the washing tank lower part 5 and turns to swirling flow within the horizontal plane. Further, the direction of the flow of the washing liquid changes to constitute the upward flow which is subjected to a second stage of the flow regulation by the flow regulating plate 3, by which the uniform ascending flow is obtd.
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